电子束/离子束光刻
Electron beam and focused ion beam applications, while quite different, require very specialized high voltage power supplies with similar performance characteristics. The most critical requirements include ultra-low output ripple, excellent regulation, high stability, low temperature coefficients and high accuracy. The task becomes even more challenging since typical e-beam and FIB power supplies consist of a variety of ground based and floating outputs. Spellman has unparalleled experience designing and building products that not only meet these demanding specifications, but that are robust and reliable for long term, trouble free operation.
The Spellman VS100 and FIB Series shown below are representative of the products that we offer for these unique applications. Feel free to contact us to discuss custom requirements or solutions.
- Ga 离子源和等离子源 FIB 电源和透镜
- 加速器、灯丝、提取器和抑制器
- 精密加速器在 30 µA 时提供 35kV
- 接地参考。 镜头高达 30kV，固定或反极性
- 多个数字接口，测试 GUI
- CE 标志和设计符合 SEMI S2
- Cold Cathode and Schottky Field Emission SEM
- Accelerator, Filament, Extractor and Suppressor
- Precision Accelerator supply -30kV at 200 µA
- Optical Vacuum Interlock
- Optically Isolated Digital Interface, test GUI
- UL Recognised, CE Marked and RoHS Compliant
- 用于场发射 SEM 的集成四极管电源
- 非常低的纹波和超稳定的输出
- 强大的电弧和短路保护
- 旨在最大限度地减少微放电事件
- RS-232 数字接口
- 用于测试和开发工作的免费 GUI
- CE、UKCA 和 RoHS 标志
- 适用于热离子扫描电镜的三极电源
- 精密加速器电源 -30kV / 170 µA
- 灯丝、Bias、PMT、Scintillator 和 Collector 输出
- 电弧和短路保护
- 差分模拟控制
- UL 认证、CE 标志和符合 RoHS
- Models from 1kV to 150kV
- 6kW Output
- Single 6U (10.5”) Chassis
- Remote Analog and Remote Ethernet Interface
- Arc and Short Circuit Protected
- User Configurable Settings Via Ethernet Interface
- Nanolithography, Micro-optics and Development Mask
- Precision -100kV Output, Ripple < 75mV
- Low/High 10μA/100μA Output Current Selection
- Separate High Voltage Monitor
- Remote Analog Control
- CE Marked and RoHS Compliant
